PLASMA-CALM

Inductively Coupled Plasma (ICP) Source for Precision Processing

Description
The PLASMA CALM is a high-frequency inductively coupled plasma (ICP) source designed for critical surface treatment applications in: Semiconductor manufacturing, Optical coating deposition/cleaning, Precision surface activation.
Featuring an innovative low-impedance planar multi-turn spiral antenna, the system delivers:
•    Ultra-low temperature plasma (Tₑ < 5 eV, Tᵢ < 0.15 eV)
•    High-density discharge (10¹⁰–10¹² cm⁻³ electron density)
•    Exceptional ionization efficiency (up to 3%)
•    Broad operating window (0.05–100 Pa)

Key Advantages
- Damage-free processing 
- Unmatched ionization efficiency
- Self-optimizing performance – Integrated auto-matching ensures stable plasma under all conditions
- Versatile pressure operation – Seamless transitions from high-vacuum to moderate pressure regimes
- Multi-pass antenna design – Low-impedance planar spiral enables uniform large-area plasma