Plasma Power Products
HONOR
RF Power Supplies for Plasma Processing Equipment
Operating Frequencies: 2.64, 6.78, 13.56 MHz
Output Power: 0.3, 0.5, 1, 2 kW
Output Impedance: 50 Ω
Designed for various gas discharge and plasma applications: Plasma Reactors: PECVD, PECET, RIE/PE systems; Discharge Systems: ICP sources, CCP electrodes.; Deposition & Ion Sources: Magnetron sputtering systems, Ion beam sources, Other plasma-assisted surface treatment tools.
GLORIA MN
High-frequency automatic impedance matching network
Operating frequencies: 2, 13.56, 27.12, 40.68 MHz
Power range: 30 - 150,000 W (30 W to 150 kW)
Input impedance: 50 or 75 Ω (selectable)
Output impedance: Customizable (on demand)
Designed for impedance matching of capacitive and inductive discharge systems including:
Magnetron sputtering systems, Plasma sources, Ion beam sources, Plasma-enhanced deposition systems, Plasma etching systems.
RF Switch
RF Power Switching and Distribution Systems
Working power: 30 - 10000 W
Device for switching a magnetron sputtering system (MSS) between operation at direct current (DC), pulsed, alternating current (AC), and high-frequency (HF) voltage.