Description
The GLORIA series of high-frequency automatic matching networks is designed to match the output impedance of an RF generator with the load impedance in various plasma and ion-beam processes.
These matching networks are compatible with a wide range of plasma processing systems, including:
•    Magnetron sputtering systems,
•    Plasma sources,
•    Ion sources,
•    Plasma-enhanced chemical vapor deposition (PECVD) systems,
•    Plasma etching systems.
Our experts will assist in selecting the optimal model for your application and provide technical support during installation and configuration.
Optional features
•    Relay module for automatic switching between DC and RF power supply modes (e.g., for switching a magnetron sputtering system between DC and RF operation without manual reconfiguration).
Control and configuration options
The matching network can be configured and controlled via:
- External PLC using the ModBus RTU protocol,
- GLORIA MB Remote Control software (via PC and ModBus RTU),
- GLORIA MB RC control panel (dedicated hardware interface for GLORIA series matching networks).

Key advantages
- Fully automatic impedance matching algorithm (self-tuning, no manual intervention required);
- High-speed impedance matching (minimizes reflected power and ensures stable operation);
- Easy setup via PC or industrial controller;
- Direct 220 V AC power input (no additional converters needed);
- Compact and robust design.