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Vacuum Process Equipment

IGNIS-A

Universal Desktop Vacuum Coating System

Description
The system is designed for depositing multilayer coatings of dielectric, semiconductor, and conductive materials using RF magnetron sputtering with inductively coupled plasma (ICP) assistance or capacitively coupled plasma (CCP) discharge.

Key Applications of the IGNIS-A Coating System:
• Anti-reflective and optical coatings: SiO₂, Si₃N₄, Nb₂O₅, TiO₂, TiN, Al₂O₃, etc.
• Functional layers for sensors and MEMS devices: In₂O₅, SnO₂, ZnO, etc.
• Biocompatible functional coatings.
• Sample preparation for scanning electron microscopy (SEM).

VTE IGNIS-A - Technical Specifications

Vacuum System:
• Rotary vane pump (pumping speed: 1.5 L/s);
• Turbomolecular pump (pumping speed: 300 L/s for nitrogen);
• Two-stage pumping speed throttling with automatic drive;
• Wide-range vacuum sensor.

Gas Delivery System:
• 2 or 3 gas supply lines with automated mass flow controllers (MFCs) (flow rate up to 50 sccm).

Process Modules:
• Two RF magnetron sputtering sources (ORBIS2-RF) with automatic shutters;
• Inductively coupled plasma source (Mollis-ICP);
• Rotating substrate holder with RF bias (CARRIER-CCP);
• Quartz crystal thickness monitor (PIEZO-01).

Dimensions: 750х650х750 mm.