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ION-BREEZE 160
ION-BREEZE 80
ION BEAM
ION-BREEZE 160
1/4
ION-BREEZE
Radio Frequency Single Grid Ion Source with Self-Compensated Ion Beam (neutral plasma beam)
Description
The source are designed for use in the processes of ion-beam assistance, plasma etching, cleaning, plasma-chemical etching, sputtering, etc.
Provides generation of a quasi-neutral (self-compensated) ion beam with an ion current density of 0.5-6 mA / cm2 and an ion energy of 10-220 eV.
There is an ion source with a single-grid ion-optical system based on a radio-frequency induction coupled discharge.
Main advantages
- Built-in impedance matching network (M’Box).
- Not required neutralizer.
- Easy control by communication port or wireless interface.
- Flexible Ion energy control.
- High density of ion current.
- Ion flux without contaminations.
- Long lifetime, easy maintenance.
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