Description
The ion source is designed for ion-beam cleaning, surface activation, ion-assisted deposition, ion-beam sputtering, and ion polishing.
It generates a monoenergetic ion beam with an ion current density of 0.5–4 mA/cm² and ion energy ranging from 50 to 1500 eV.
The source features a three-grid ion-optical system powered by a high-frequency inductively coupled plasma (ICP) discharge. Depending on the ion-optical system configuration, it can produce:
•    A divergent (defocused) ion beam,
•    A collimated (parallel) ion beam,
•    A convergent (focused) ion beam.

Key advantages

- High ion current density;
- Minimal contamination of the substrate;
- Long operational lifetime and easy maintenance;
- Integrated automatic impedance matching unit;
- Simple setup via communication interface;
- Option to supply a complete system, including power supplies and controller.